Focused radiation beam induced deposition

ABSTRACT

A method includes loading a mask having a defect into a chamber. The defect of the mask is repaired by forming a repair feature in a repair region of the mask. The forming the repair feature includes irradiating the repair region of the mask with a radiation beam. The forming the repair feature further includes while irradiating the repair region, injecting a precursor gas into the chamber to form a first film of the repair feature on the repair region, and while irradiating the repair region, injecting a cleaning gas into the chamber. The cleaning gas reacts with an impurity material in the first film to transform the first film into a first cleaned film.

PRIORITY DATA

The present application is a divisional application of U.S. patentapplication Ser. No. 14/942,893, filed Nov. 16, 2015, entitled “FOCUSEDRADIATION BEAM INDUCED DEPOSITION” issuing as U.S. Pat. No. 9,915,866,which is hereby incorporated by reference in its entirety.

BACKGROUND

In semiconductor integrated circuit (IC) industry, technologicaladvances in IC materials and design have produced generations of ICswhere each generation has smaller and more complex circuits than theprevious generation. In the course of IC evolution, functional density(i.e., the number of interconnected devices per chip area) has generallyincreased while geometry size (i.e., the smallest component (or line)that can be created using a fabrication process) has decreased. Thisscaling down process generally provides benefits by increasingproduction efficiency and lowering associated costs. Such scaling downhas also increased the complexity of IC processing and manufacturing.

For example, focused ion beam or focused electron beam induceddeposition has been used for thin film deposition. In such a method, aprecursor gas is introduced near a substrate held in a sealed chamberand a focused ion or electron beam causes the precursor gas to undergomolecular dissociation. Dissociated molecules adsorb onto the surface ofthe substrate, forming a thin film thereon. Film impurity has been onemain disadvantage associated with these techniques. Such impurityresults in degradation of finally deposited thin films, and thereforeshould be avoided.

Therefore, what is needed is an improved focused radiation beam induceddeposition method.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a flowchart illustrating an embodiment of a method ofrepairing a mask according to one or more aspects of the presentdisclosure.

FIGS. 2A, 2B, and 2C are cross-sectional views of a portion of variousmasks according to some embodiments.

FIG. 3 is a schematic view of a focused electron beam deposition systemaccording to some embodiments.

FIGS. 4A, 4B, and 4C are cross-sectional views of a portion of a maskwhere a first sublayer of a repair feature on a mask is being depositedaccording to some embodiments.

FIGS. 5A, 5B, and 5C are cross-sectional views of a portion of a maskwhere a first sublayer of a repair feature on a mask is being cleanedaccording to some embodiments.

FIGS. 6A, 6B, and 6C are cross-sectional views of a portion of a maskwhere a second sublayer of a repair feature on a mask is being depositedaccording to some embodiments.

FIGS. 7A, 7B, and 7C are cross-sectional views of a portion of a maskwhere a second sublayer of a repair feature on a mask is being cleanedaccording to some embodiments.

FIGS. 8A, 8B, and 8C are cross-sectional views of a portion of variousmasks after repair features are formed to repair the masks according tosome embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

It is noted that embodiments of the present disclosure may benefitvarious semiconductor manufacturing processes including, but not limitedto, integrated circuit (IC) fabrication, mask fabrication, and maskrepair.

Referring now to FIG. 1, illustrated therein is a flowchart of oneembodiment of a method 100 used to repair a mask (also referred to as aphotomask). The method 100 begins at block 102 where a mask including adefect is provided. In various embodiments, the mask may be a phaseshift mask, a chromeless phase lithography (CPL) mask, a binary mask, adeep ultraviolet (DUV) mask, an extreme ultraviolet (EUV) mask, or othertype of masks. A defect repair region may be identified for repairingthe defect.

Referring to the examples of FIGS. 2A, 2B, and 2C, in an embodiment ofblock 102, exemplary masks 200, 220, and 240 having defects areprovided, and a defect repair region is identified in each of the masks200, 220, and 240. Referring now to the example of FIG. 2A, a mask 200having a defect 208A is provided. In some embodiments, the mask 200includes a substrate 204 including fused silica (SiO₂), fused quartz,calcium fluoride, or other suitable material. In some embodiments, themask 200 includes an absorber layer 208, which may include a singlelayer or multiple layers of material selected from the group consistingof chromium (Cr), chromium oxide (CrO), titanium nitride (TiN), tantalumnitride (TaN), tantalum (Ta), titanium (Ti), aluminum-copper (Al-Cu),palladium, tantalum boron nitride (TaBN), aluminum oxide (AlO),molybdenum (Mo), and other suitable materials. The absorber layer 208may include a material of high purity (e.g., carbon impurity less than0.1 ppm). In the specific embodiment of the mask 200 shown in FIG. 2A,the absorber layer 208 is patterned according to an IC layout. When anincident radiation 210 is projected onto the mask 200, the patternedabsorber layer 208 absorbs the radiation, thereby forming a patternedradiation 212. To further this embodiment, the mask 200 is found to havea defect 208A (also referred to as an absorber pattern defect) where thematerial in a defect repair region 206 of the patterned absorber layer208 is missing, and the patterned radiation 212 includes undesirableradiation 214 passing through the defect repair region 206. To repairthis defect 208A, a repair feature (e.g., including the same material asthe material of the absorber layer 208) may be formed in the defectrepair region 206 in subsequent steps according to some embodiments, sothat radiation in the defect repair region 206 will be absorbed.

Referring now to the example of FIG. 2B, a CPL mask 220 is provided. Insome embodiments, the CPL mask 220 includes a substrate 204 includingfused silica (SiO₂), fused quartz, calcium fluoride, or other suitablematerial. In one example, the substrate 204 includes fused quartz ofhigh purity (e.g., with total impurities less than 20 ppm and/or carbonimpurity less than 0.1 ppm). In the embodiment of FIG. 2B, the substrate204 includes a plurality of phase shift regions 224 andnon-phase-shifting regions 222 (e.g., including the same material as thematerial of the substrate 204). The radiation 226 passing through thephase shift regions 224 is phase-shifted by 180 degrees from theradiation 228 passing through the non-phase-shifting regions 222.Circuit features may be formed on a wafer with radiations (e.g.,radiation 226 and 228) passing the neighboring regions that are 180degrees out of phase. To further this embodiment, the CPL mask 220 isfound to have a defect 222A where materials are missing in a particularnon-phase-shifting region, and the radiation 230 passing through theparticular non-phase-shifting region does not have the desired phase(e.g., same as the phase of the radiation 228). To repair this defect222A, a repair feature (e.g., including the same material as thesubstrate 204 and/or non-phase-shifting regions 222) may be deposited ona surface of a defect repair region 206 in subsequent steps according tosome embodiments, so that radiation passing through the defect repairregion 206 will have a phase that is the same as the radiation 228passing through non-phase-shifting regions 222.

Referring now to the example of FIG. 2C, an EUV mask 240 is provided. Insome embodiments, the EUV mask 240 includes a low thermal expansionmaterial (LTEM) mask substrate 204, a reflective multilayer (ML) 250, abuffer layer 252, an absorber layer 254 and a protection layer 256. Inaddition, a conductive layer 258 may be deposited on a backside of theLTEM mask substrate 204 for electrostatic chucking purposes.

In various embodiments, the LTEM mask substrate 204 may include fusedsilica (SiO₂), fused quartz, calcium fluoride (CaF₂), silicon carbide,silicon oxide-titanium oxide alloy and/or other suitable material. TheML 250 includes a plurality of film pairs, such as molybdenum-silicon(Mo/Si) film pairs (e.g., a layer of molybdenum above or below a layerof silicon in each film pair). Alternatively, the ML 250 may includemolybdenum-beryllium (Mo/Be) film pairs, or any two materials or twomaterial combinations with large difference in refractive indices andsmall extinction coefficients. In an example, the ML 250 includes 40pairs of layers of Mo/Si. Each Mo/Si film pair has a thickness of about7 nanometer (nm), e.g., about 3 nm for Mo and about 4 nm for Si. Thebuffer layer 252 may include ruthenium (Ru) or Ru compounds such asruthenium-boron (RuB) or ruthenium-silicon (RuSi) and acts as an etchingstop layer in a patterning or repairing process of the absorber layer254. The absorber layer 254 absorbs incident EUV radiations projectedthereon. The absorber layer 254 may include a single layer or multiplelayers of material selected from the group consisting of chromium (Cr),chromium oxide (CrO), titanium nitride (TiN), tantalum nitride (TaN),tantalum (Ta), titanium (Ti), aluminum-copper (Al-Cu), palladium,tantalum boron nitride (TaBN), aluminum oxide (AlO), molybdenum (Mo),and other suitable materials. The protection layer 256 protects theabsorber layer 254 from oxidation when the EUV mask 240 is in a cleaningprocess. In the EUV mask 240 shown in FIG. 2C, the absorber layer 254 ispatterned according to an IC layout. When an incident EUV radiation isprojected onto the EUV mask 240, the patterned absorber layer 254absorbs the EUV radiation while the ML 250 reflects the EUV radiation,thereby forming a patterned EUV radiation.

In the example illustrated in FIG. 2C, the EUV mask 240 is found to havean EUV phase defect 260. The phase defect 260, left uncompensated, maydistort the patterned EUV radiation. To repair the phase defect 260, arepair feature may be formed on a surface of a defect repair region 206to repair the phase defect 260 in subsequent steps according to someembodiments.

In various embodiments, impurities in the deposited repair feature mayaffect various radiation properties (e.g., absorptivity, reflectivity,and/or transmissivity) of the deposited repair feature, thereby affectthe patterned radiation (e.g., phase, and/or amplitude) generated by themask. Thus, in some embodiments, the imaging performance of the mask isimproved by reducing the impurities in the deposited repair feature.

Referring to FIGS. 1 and 3, the method 100 proceeds to block 104, wherea surface of the defect repair region of the mask is irradiated with aradiation beam. Referring now to the example of FIG. 3, a focused beaminduced deposition (FBID) system 300 is illustrated. In someembodiments, the FBID system 300 includes a vacuum chamber 302 whichhouses various components of the FBID system 300; a beam generator 304that is configured to generate an energetic and focused radiation beam306; a variable pressure sub-chamber 310; and a stage 312 that isconfigured to hold a target 314 (e.g., one of the masks 200, 220, and240) inside the sub-chamber 310. As illustrated in the example of FIG.3, the FBID system 300 further includes gas inlets 320A, 320B, and 320Cthat are configured to introduce (or inject) various gases fromrespective reservoirs 332A, 332B, and 332C into the sub-chamber 310. Invarious embodiments, the FBID system 300 may include any number of gasinlets and reservoirs to introduce one or more gases. The FBID system300 may further includes a control module 308, a secondary electrondetector 316, and/or a pump system 318. In an embodiment, the controlmodule 308 is coupled to a computer system for controlling the movementof the focused radiation beam 306 relative to the target 314. Forexample, the radiation beam 306 may be scanned over certain areas (e.g.,the defect repair region 206) of the target 314 so that a thin film isdeposited with predefined dimensions. In some embodiments, the secondaryelectron detector 316 may detect and image secondary electrons in thesub-chamber 310. In some embodiments, the pump system 318 may produceand maintain a vacuum in the chamber 302.

In some embodiments, the beam generator 304 includes a focused ion beamgun. For example, positively or negatively charged ions can be generatedfrom a gas, such as hydrogen, helium, carbon, nitrogen, oxygen, neon,argon, krypton, and xenon. Alternatively, in some embodiments, the beamgenerator 304 includes a focused electron beam gun. For example,electrons can be generated from a conducting material by heating theconducting material to a very high temperature, whereby the electronshave sufficient energy to overcome a work function barrier and escapefrom the conducting material (thermionic sources). For further example,electrons can also be generated by applying an electric fieldsufficiently strong so that electrons tunnel through the work functionbarrier of a conducting material (field emission sources).

In some embodiments, the beam generator 304 further includes variouscomponents for condensing, magnifying, and/or directing the radiationbeam 306. For example, the beam generator 304 may include condenserlenses, projection aperture, scan coils, objective lenses, and/or othercomponents known in the art. In an example, the beam generator 304 is atungsten hairpin filament source XL30 environmental scanning electronmicroscope (ESEM™ from the FEI Company at Hillsboro, Ore., which maygenerate an electron beam having energy ranging from about 10 keV toabout 300 keV.

In some embodiments, the radiation beam 306 generated by the beamgenerator 304 is directed onto a surface of the target 314. In variousembodiments, the target 314 may be substrate, such as a wafer substrate,a mask substrate, or any other suitable substrate. In the example ofFIG. 3, the target 314 is a mask (e.g., any of the masks 200, 220, 240)with a defect repair region 206 irradiated by the radiation beam 306. Insome embodiments, the target 314 includes a silicon wafer. Alternativelyor additionally, the target 314 may include another elementarysemiconductor, such as germanium, a compound semiconductor, an alloysemiconductor, and/or or a semiconductor on insulator (SOI).

In some embodiments, the target 314 is held by the stage 312 inside thesub-chamber 310. The stage 312 may secure the target 314 using vacuum,e-chucking, or other suitable methods, and provide accurate position andmovement of the target 314 relative to the radiation beam 306. In anembodiment, the stage 312 includes a plurality of motors, roller guides,and/or tables.

Referring now to FIGS. 1, 3, 4A, 4B, and 4C, the method 100 proceeds toblock 106, where a precursor gas and a first assistance gas areintroduced to a surface of the defect repair region of the mask to forma sublayer of a repair feature on the surface. Referring to the exampleof FIGS. 4A, 4B, and 4C, a precursor gas 406 is introduced into thesub-chamber 310 (e.g., using a gas inlet 320A to introduce the precursorgas from a reservoir 332A) near a surface of the defect repair region206 of the target 314. In some embodiments, the radiation beam 306focused on the surface of the defect repair region 206 inducesdissociation of the gas molecules, and materials are deposited on thesurface of the defect repair region 206 to form the sublayer 402. In oneexample, the radiation beam 306 (e.g., an electron beam) has very highenergy (e.g., between about 10 keV and about 300 keV), which may causesthe material near the surface of the defect repair region 206 to absorbprimary electrons and re-emit secondary electrons having a wide spectrumof energies and angles. Such secondary electrons may cause dissociationof the precursor gas molecules, resulting in a solid deposit on thesurface of the defect repair region 206 of the target 314 and volatileby-products in the sub-chamber 310.

In some embodiments, as illustrated in FIGS. 4A, 4B, and 4C, a firstdeposition scan process may be performed to form the sublayer 402 on asurface of the defect repair region 206. As illustrated in FIG. 4A, afirst deposition step of the first deposition scan process is performed.The radiation beam 306 is focused on the dwell point 410 of the surfaceof the defect repair region 206 and settles on the dwell point 410 for apredetermined dwell time (e.g., about 1 μs). After the first depositionstep is performed, a first material 404 is deposited around the dwellpoint 410.

As illustrated in the example of FIG. 4B, the first deposition scanprocess then proceeds to a second deposition step, and the radiationbeam 306 is focused on the next dwell point 412 and settles on the dwellpoint 412 for a predetermined dwell time. In some embodiments, apredefined first dwell point distance 416 extending between the adjacentdwell points 410 and 412 may be determined based on the dimensions(e.g., height H1, deposition step width W1, and/or the profile) of thefirst material 404 formed by each deposition step. After the seconddeposition step is performed, the first material 404 is deposited inareas around the dwell points 410 and 412.

Referring now to the example of FIG. 4C, after multiple deposition stepsare repeated, the radiation beam 306 is scanned across the surface ofthe defect repair region 206. The radiation beam 306 is now focused onthe last dwell point 414 and settles on the dwell point 414 for apredetermined dwell time. As shown in FIG. 4C, after the firstdeposition scan process is finished, a sublayer 402 including the firstmaterial 404 is formed over the surface of the defect repair region 206.

In some embodiments, the precursor gas 406 is a precursor gas or amixture of precursor and carrier gases for depositing the sublayer 402over the surface of the defect repair region 206. For example, theprecursor gas 406 may be suitable for depositing a metal film, such asAl, Au, Co, Cr, Cu, Fe, Mo, Ni, Os, Pd, Pt, Rh, Ru, Re, or W. Forfurther example, the precursor gas 406 may be suitable for depositing adielectric film or a semiconductor compound film, such as GaAs, GaN, Si,Si₃N₄, SiOx (e.g., SiO₂), or TiOx (e.g., TiO₂). In various embodiments,the precursor gas 406 may include Al(CH₃)₃, Phenanthrene (C₁₄H₁₀),Co₂(CO)₈, Cr(C₆H₆)₂, Cr(CO)₆, Fe(CO)₅, Mo(CO)₆, Ni(CO)₄, Os₃(CO)₁₂,Palladium acetate (Pd(OOCCH₃)₂), Ru₃(CO)₁₂, Re₂(CO)₁₀, Tetraethylorthosilicate (TEOS), Ti(—OC₃H₇)₄, W(CO)₆, and/or other suitablematerial.

In some embodiments, some unwanted dissociated elements (also referredto as contaminants or impurities) of the precursor gas 406 remain in thefirst material 404, and may affect the purity of the first material 404.In one example, the first material 404 of the deposited sublayer 402 mayinclude impurities at a first impurity level (e.g., carbon impurityequal to or greater than 7% by weight).

Referring now to FIGS. 4A, 4B, and 4C, in some embodiments, anassistance gas 408 may be introduced to the surface of the defect repairregion (e.g., using a gas inlet 320B to introduce the precursor gas froma reservoir 332B) during some or all deposition steps of the firstdeposition scan process. The introduction of the assistance gas 408 mayserve to reduce impurities. In various embodiments, the assistance gas408 may be injected (e.g., simultaneously with the precursor gas 406)into the sub-chamber 310 and co-existent with the precursor gas 406. Insome embodiments, the gas inlets for the precursor gas 406 andassistance gas 408 may be turned on and/or off at the same time. In someembodiments, the assistance gas 408 may assist the decomposition of theprecursor gas 406 and/or lower contaminants in the sublayer 402. Forexample, the assistance gas 408 may have low dissociation energy, suchas less than approximately 50 eV, and can be easily dissociated underthe focused radiation beam 306. For further example, the dissociatedatoms of the assistance gas 408 may quickly react with the precursor gas406 to break the chemical bonds thereof, producing highly reactive freeradicals. For further example, the assistance gas 408 (and/or thedissociated atoms thereof) may help lower contaminants in the sublayer402 by reacting with contaminants to form volatile by-products. In anembodiment, the assistance gas 408 is a nitrogen oxide such as nitrogendioxide (NO₂), nitrous oxide (N₂O), nitrosylazide (N₄O), nitrate radical(NO₃), dinitrogen trioxide (N₂O₃), dinitrogen tetroxide (N₂O₄),dinitrogen pentoxide (N₂O₅), and trinitramide (N(NO₂)₃).

To further this embodiment, the nitrogen oxide molecules, oncedissociated, produce highly active free radicals (e.g., NO* and/or 0*).The free radicals may promote the dissociation of precursor gasmolecules as well as the removal of the dissociated by-products bylinking up with them to form evaporable products, thereby improving thepurity of the deposited sublayer 402.

In some embodiments, the assistance gas 408 is water vapor (H₂O), oxygen(O₂), ozone (O₃), or a mixture thereof. In some embodiments, theassistance gas 408 is a polarized gas. Polarized gas molecules mayadsorb to the surface of the defect repair region 206 longer thanneutral gas molecules, thereby providing higher conversion efficiency.In various embodiments, the assistance gas 408 may benefit thedeposition of the sublayer 402 where the precursor gas 408 includescarbon atoms.

In some embodiments, various parameters of the first deposition scanprocess may be controlled so that the sublayer 402 has a desired heightH1 and/or width W1. For example, the parameters may include a focal areadiameter of the radiation beam 306, the predetermined dwell time of thedeposition step, the concentration of the precursor gas 406, the flowrates of the precursor gas 406 and assistance gas 408 (if any) injectedinto the sub-chamber 310, and/or a time period that the precursor gas406 and/or assistance gas 408 is introduced (e.g., by turning on and offthe gas inlet 320). In some embodiments, the desired height H1 is lessthan about 5 nanometers (nm) (e.g., in a range of about 2 nm and 5 nm,or less than about 2 nm).

Referring now to FIGS. 1, 5A, 5B, and 5C, the method 100 proceeds toblock 108, where the precursor gas and assistance gas (if any) used todeposit the sublayer 402 are removed from the sub-chamber 310, and thena cleaning gas is introduced to a surface of the deposited sublayer 402to improve the purity of the deposited sublayer 402. In someembodiments, the gas inlets for the precursor gas 406 and/or assistancegas 408 are turned off, and a pump may be used to pump out residualgases (e.g. the precursor gas 406 and assistance gas 408 if any) fromthe sub-chamber 310.

In some embodiments, after the precursor gas 406 and/or assistance gas408 is removed, a cleaning gas 504 may be injected (e.g., using the gasinlet 320C and reservoir 332C) into the sub-chamber 310. In someembodiments, the cleaning gas 504 may lower contaminants in the sublayer402. In one example, the cleaning gas 504 may have low dissociationenergy, such as less than about 50 eV, and can be easily dissociatedunder the focused radiation beam 306. For further example, the cleaninggas 504 (and/or the dissociated atoms thereof) may help reduce aconcentration of contaminants within the sublayer 402 by reacting withthese contaminants to form volatile by-products. In an embodiment, thecleaning gas 504 is a nitrogen oxide such as nitrogen dioxide (NO₂),nitrous oxide (N₂O), nitrosylazide (N₄O), nitrate radical (NO₃),dinitrogen trioxide (N₂O₃), dinitrogen tetroxide (N₂O₄), dinitrogenpentoxide (N₂O₅), and/or trinitramide (N(NO₂)₃). To further thisembodiment, the nitrogen oxide molecules, once dissociated, producehighly active free radicals (NO* and O*). The free radicals may promotethe removal of the contaminants by linking up with them to formevaporable products, thereby improving the purity of the depositedsublayer 402. In some embodiments, the cleaning gas 504 is water vapor(H₂O), O₂, ozone (O₃), or a mixture thereof. In some embodiments, thecleaning gas 504 is a polarized gas. In some embodiments, the cleaninggas 504 may include the same material as the assistance gas 408, and/orthe same gas inlet and reservoir may be used to inject the cleaning gas504 and assistance gas 408. Alternatively, the cleaning gas 504 and theassistance gas 408 are different, and different gas inlets andreservoirs may be used to inject the cleaning gas 504 and the assistancegas 408 respectively.

In some embodiments, as illustrated in FIGS. 5A, 5B, and 5C, a firstcleaning scan process is performed to clean the sublayer 402 withpredefined dimensions. As illustrated in FIG. 5A, a first cleaning stepof the first cleaning scan process is performed, and the radiation beam306 is moved to focus on a dwell point 506 of a surface 512 of thesublayer 402, and settles on the dwell point 506 for a predetermineddwell time (e.g., about 1 μs).

In the example illustrated in FIG. 5A, after the first cleaning step isperformed, contaminants in the first material 404 in a first portion ofthe sublayer 402 with a height H1 and a width W2 around the dwell point506 may be removed (e.g., by reacting with the dissociated atoms of thecleaning gas 504 to form volatile by-products), thereby transforming thefirst material 404 in the first portion of the sublayer 402 to a secondmaterial 502 having a reduced impurity concentration. In someembodiments, the second material 502 is substantially the same as thefirst material 404; however, the second material 502 has a lowerimpurity level than the first material 404.

Alternatively, in some embodiments, the height H1 is greater than acleaning distance threshold TH, and only a top portion of the sublayer402 (e.g., with a height TH) may be cleaned by the first cleaning step,and a bottom portion of the sublayer 402 may not be cleaned by the firstcleaning step, and remain substantially the same.

Thus, in some embodiments, to uniformly reduce the impurity of theentire sublayer 402, it can be important that the desired height H1 ofthe sublayer 402 is designed to be equal to or less than the cleaningdistance threshold TH. In various embodiments, the cleaning distancethreshold TH and/or the width W2 may be affected by a focal areadiameter of the radiation beam 306, the predetermined dwell time of thecleaning step, the concentration of the cleaning gas 504 in thesub-chamber 310, and/or a flow rate of the cleaning gas 504 injectedinto the sub-chamber 310, and/or other parameters known in the art. Insome embodiments, various parameters (e.g., the predetermined dwelltime, dwell points locations, dwell points distance) of the firstcleaning scan process may be different from the parameters of the firstdepositing scan process. In some embodiments, the cleaning distancethreshold TH is equal to or less than about 5 nm (e.g., in a range ofabout 2 nm and 5 nm, or less than 2 nm), and the desired height H1 isdesigned to be less than or equal to the cleaning distance threshold TH.

As illustrated in the example of FIG. 5B, the first cleaning scanprocess then proceeds to a second cleaning step, and the radiation beam306 is focused on the next dwell point 508 and settles on the dwellpoint 508 for a predetermined dwell time. In some embodiments, apredefined second dwell point distance 516 extending between theadjacent dwell points 506 and 508 may be determined based on thedimensions (e.g., width W2 and/or the profile) of the second material502 formed by each cleaning step. After the second cleaning step isfinished, the first material 404 in a second portion of the sublayer 402around the dwell point 508 is transformed to a second material 502 withreduced impurity by removing contaminants in the first material 404.

Referring now to the example of FIG. 5C, after multiple cleaning stepsare repeated, the radiation beam 306 is scanned across the surface 512.The radiation beam 306 is now focused on the dwell point 510 and settleson the dwell point 510 for a predetermined dwell time. As shown in theexample of FIG. 5C, after the first cleaning scan process is finished,the entire sublayer 402 includes the second material 502 includingimpurities (e.g., carbon) at a second impurity level (e.g., carbonimpurities equal to or less than about 100 ppm by weight) less than thefirst impurity level of the first material 404. In some examples, thesecond impurity level is at least less than about 10% of the firstimpurity level.

Referring now to FIGS. 1, 6A, 6B, 6C, 7A, 7B, 7C, 8A, 8B, and 8C, themethod 100 proceeds to block 110, where the two steps of block 106 and108 are repeated until the repair feature reaches predetermineddimensions. In some embodiments, at block 110, after the first cleaningscan process is finished, it is determined that the repair featureincluding a single sublayer 402 has reached the predetermineddimensions, and that the process to form the repair feature to repairthe mask is completed. Alternatively, as shown in the specificembodiments of FIGS. 6A, 6B, 6C, 7A, 7B, and 7C, after the firstcleaning scan process is finished, it is determined that the repairfeature including the single layer 402 has not reached the predetermineddimensions (e.g., a predetermined repair feature height 610), and thesteps of blocks 106 and 108 are repeated.

In some embodiments, prior to repeating the steps of blocks 106 and 108,the cleaning gas 504 is removed from the sub-chamber 310 (e.g., by apump). Alternatively, in some embodiments, the cleaning gas 504 is notremoved from the sub-chamber 310 prior to repeating the steps of blocks106 and 108, and may function as an assistance gas during a seconddeposition scan process.

Referring now to the examples of FIGS. 6A, 6B, and 6C, a seconddeposition scan process is performed on the surface 512 of the sublayer402 to form a sublayer 602. In some embodiments, the second depositionprocess may be substantially similar to the first deposition scanprocess described with respect to FIGS. 4A, 4B, and 4C. Referring to theexamples of FIGS. 6A and 6B, the first and second deposition steps ofthe second deposition scan process are performed on adjacent dwellingpoints 604 and 606 on the surface 512 respectively, and the firstmaterial 404 is deposited on portions of the surface 512 around thedwelling points 604 and 606. Referring now to the example of FIG. 6C,after multiple deposition steps are performed, the radiation beam 306 isscanned across the surface 512 and focused to the dwell point 608 on thesurface 512. As shown in FIG. 6C, after the second deposition scanprocess is finished, a sublayer 602 with a height H2 including the firstmaterial 404 is formed over the sublayer 402.

In some embodiments, the sublayer 602 is substantially similar to thesublayer 402, and may have the same predetermined dimensions as thesublayer 402. Alternatively, in some embodiments, the dimensions of thesublayer 602 may be different from the dimensions of the sublayer 402(e.g., the desired height H2 is different from the desired height H1),and various parameters (e.g., dwell points, dwell time, dwell pointsdistance) of the second deposition scan process may be designeddifferently from the parameters of the first deposition scan processbased on the predetermined dimensions (e.g., the desired height H2) ofthe sublayer 602.

Referring now to FIGS. 7A, 7B, and 7C, a second cleaning scan process isperformed on the surface 702 of the sublayer 602 to remove thecontaminants in the sublayer 602. In some embodiments, the secondcleaning scan process is substantially similar to the first cleaningscan process described with respect to FIGS. 5A, 5B, and 5C. Referringto FIGS. 7A and 7B, the first and second cleaning steps of the secondcleaning scan process are performed on adjacent dwelling points 706 and708 respectively, and the first material 404 in portions of the sublayer602 around the dwelling points 706 and 708 are transformed to the secondmaterial 502 with an improved purity. Referring to FIG. 7C, aftermultiple cleaning steps are performed, the radiation beam 306 is scannedacross the surface 702 and focused on the dwell point 710. As shown inthe example of FIG. 7C, after the second cleaning scan process isfinished, the first material 404 in all portions of the sublayer 602 iscleaned and transformed to the second material 502. The repair feature714 now includes sublayers 402 and 602 of the second material 502 withan improved purity.

In some embodiment, various parameters (e.g., dwell points, dwell time,dwell points distance, cleaning distance threshold) of the secondcleaning scan process may be different from the parameters of the firstcleaning scan process, and may be determined based on the dimensions(e.g., desired height H2) of the sublayer 602. To uniformly reduce theimpurity of the entire sublayer 602, it can be important that thedesired height H2 of the sublayer 602 is designed to be equal to or lessthan the cleaning distance threshold of the second cleaning scanprocess.

Referring back to FIG. 1, at block 110, the method 100 repeats the stepsperformed in the blocks 506 and 508 until the repair feature 714including multiple sublayers reaches predetermined dimensions. Referringnow to the examples of FIGS. 8A, 8B, and 8C, illustrated are repairedmasks 210, 220, and 240 of FIGS. 2A, 2B, and 2C after a repair feature714 with predetermined dimensions is formed in the defect repair region206 of each of the repaired masks according to some embodiments.Referring now to the example of FIG. 8A, a repair feature 714 isdisposed in the defect repair region 206 of the repaired mask 200. Thematerial 502 of the repair feature 714 may include the same as thematerial of the absorber layer 208. When an incident radiation 210 isprojected onto the mask 200, the patterned absorber layer 208 and therepair feature 714 absorb the radiation, thereby forming a patternedradiation 802 without any radiation passing through the defect repairregion 206. In some embodiments, the second material 502 may have animpurity level (e.g. carbon impurity equal to or less than 100 ppm byweight) that is different from the impurity level (e.g., carbon impurityequal to 0) of the absorber layer 208. In some embodiments, improvingthe purity of the repair feature 714 may help control the transmittanceof the repair feature 714. For example, the repair feature 714 may havea first transmittance that is substantially similar to a secondtransmittance of the absorber layer 208.

Referring now to the example of FIG. 8B, a repair feature 714 ofpredetermined dimension is disposed in the defect repair region 206 ofthe repaired mask 220. When an incident radiation 210 is projected ontothe mask 220, the radiation 804 passing through the repair feature 714disposed in the defect repair region 206 has a first phase. In someembodiments, the repair feature 714 has an impurity level that isdifferent from the impurity level of the substrate 204 and/or thenon-phase-shifting regions 222. In some examples, the repair feature 714has an impurity level that is higher than the impurity level of thesubstrate 204 and/or the non-phase-shifting regions 222. In someexamples, the repair feature 714 has an impurity level that is less thanthe impurity level of the substrate 204 and/or the non-phase-shiftingregions 222. In one example, the difference between the carbon impuritylevel of the repair feature 714 and the carbon impurity level of thesubstrate 204 is less than about 1% of the carbon impurity level of thesubstrate 204. In some embodiments, improving the purity of the repairfeature 714 may help control the transmittance of the repair feature andthe phase shift caused by the repair feature 714. For example, the firstphase and/or first amplitude of the radiation 804 may be substantiallysimilar to a second phase and/or second amplitude of the radiation 228passing through the non-phase-shifting regions 222.

Referring now to the example of FIG. 8C, a repair feature 714 ofpredetermined dimensions is disposed in the defect repair region 206 tocompensate and repair the phase defect 260 of the EUV mask 240. In someembodiments, the repair feature 714 includes alternating repair layers716A and repair layers 716B. In one example, the repair layer 714Aincludes a high index of refraction material (e.g., Mo, MoO₂, Cr, W, La,Mg, Ru, or TaBN), and the repair layer 716B includes a low index ofrefraction material (e.g., Si, TEOS, B₄C, SiOZ, Y, or SiC). Each of therepair layers 716A and 716B may include a plurality of sublayers of therespective material formed by the steps of block 106 and block 108. Insome embodiments, improving the purity of the repair feature 714 helpimprove the reflectivity of the repair feature 714 and accuratelycontrol the phase shift caused by the repair feature 714, therebycompensate the reflective loss and phase shift caused by the EUV phasedefect 260.

The embodiments of the present disclosure offer advantages over existingart, although it is understood that different embodiments may offerdifferent advantages, not all advantages are necessarily discussedherein, and that no particular advantage is required for allembodiments. One of the advantages in some embodiments is that a layerincluding a high purity material may be accurately deposited by using afocused radiation beam induced deposition process. By forming each ofthe multiple very thin sublayers (e.g., with a thickness of about 2 nm)of the high purity layer using a sequence including a deposition processfollowed by a cleaning process, the impurity level in the high puritylayer is reduced significantly. Another advantage in some embodiments isthat the deposited high purity layer may be used to form repair featuresto repair defects in masks. The improved purity may help better controlvarious radiation properties of the repair feature, and therebyimproving the imaging performance of the repaired masks.

Thus, one aspect of the present disclosure involves a semiconductordevice fabrication method. A first surface of a substrate is irradiatedwith a radiation beam. While irradiating the first surface of thesubstrate, a precursor gas is introduced near the first surface todeposit a layer including a first material. The precursor gas is removedfrom near the first surface after the depositing the layer. After theremoving the precursor gas and prior to forming another layer over thelayer, while irradiating a second surface of the layer, a cleaning gasis introduced near the second surface of the layer to transform thefirst material into a second material.

Another aspect of the present disclosure involves a method includingirradiating a first surface of a substrate with a radiation beam. Whileirradiating the first surface, a sequence is performed to form a firstcleaned sublayer over the substrate. The sequence includes introducing aprecursor gas near the first surface of the substrate to deposit a firstsublayer and removing the precursor gas from near the first surfaceafter the depositing the first sublayer. The sequence further includesintroducing a cleaning gas near the deposited first sublayer totransform the deposited first sublayer into the first cleaned sublayer,and while irradiating a second surface of the first cleaned sublayer,repeating the sequence to form a second cleaned sublayer over the firstcleaned sublayer.

Yet another aspect of the present disclosure involves a method includingloading a mask having a defect into a chamber. The defect of the mask isrepaired by forming a repair feature in a repair region of the mask. Therepair region of the mask is radiated with a radiation beam. Whileirradiating the repair region, a precursor gas is injected into thechamber to form a first film of the repair feature on the repair region.The injection of the precursor gas is stopped after forming the firstfilm. While irradiating the repair region, a cleaning gas is injectedinto the chamber. The cleaning gas reacts with an impurity material inthe first film to transform the first film into a first cleaned film.

The foregoing has outlined features of several embodiments so that thoseskilled in the art may better understand the detailed description thatfollows. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method, comprising: loading a mask having adefect into a chamber; repairing the defect of the mask by forming arepair feature in a repair region of the mask, wherein the forming therepair feature includes: irradiating the repair region of the mask witha radiation beam; while irradiating the repair region, injecting aprecursor gas into the chamber to form a first film of the repairfeature on the repair region; and while irradiating the repair region,injecting a cleaning gas into the chamber, wherein the cleaning gasreacts with an impurity material in the first film to transform thefirst film into a first cleaned film.
 2. The method of claim 1, whereinthe forming the repair feature further includes: prior to the injectingthe cleaning gas into the chamber, stopping the injection of theprecursor gas after forming the first film.
 3. The method of claim 2,wherein the forming the repair feature further includes: after thestopping of the injection of the precursor gas, pumping the precursorgas out of the chamber.
 4. The method of claim 1, wherein the formingthe repair feature further includes: while irradiating the repair regionand after the transforming the first film into the first cleaned film,injecting the precursor gas into the chamber to form a second film overthe first cleaned film; stopping the injection of the precursor gasafter the forming the second film; and while irradiating the repairregion and after forming the second film, injecting the cleaning gasinto the chamber, wherein the cleaning gas reacts with the impuritymaterial in the second film to transform the second film into a cleanedsecond film.
 5. The method of claim 4, wherein the forming the repairfeature further includes: forming a plurality of cleaned films byrepeating the steps of injecting the precursor gas, stopping theinjection of the precursor gas, and injecting the cleaning gas.
 6. Themethod of claim 1, wherein the mask is a chromeless phase lithography(CPL) mask.
 7. The method of claim 6, further comprising: projecting asecond radiation beam onto the repaired mask, wherein a first radiationpassing through the repair feature disposed in the repair region has afirst phase substantially similar to a second phase of a secondradiation passing through a second region of the mask.
 8. The method ofclaim 1, wherein the mask is an extreme ultraviolet (EUV) mask.
 9. Amethod, comprising: loading a mask having a defect into a chamber;repairing the defect of the mask by forming a repair feature in a repairregion of the mask, wherein the forming the repair feature includes:irradiating a first surface of the repair region with a radiation beam;while irradiating the repair region, injecting a precursor gas into thechamber near the first surface to deposit a first layer of the repairfeature in the repair region, the first layer including a firstmaterial; removing the precursor gas from near the first surface afterthe depositing the first layer; and while irradiating a second surfaceof the first layer, introducing a cleaning gas near the second surfaceof the first layer to transform the first material into a secondmaterial.
 10. The method of claim 9, further comprising: inducing areaction between the cleaning gas and impurities in the first materialof the first layer using the radiation beam.
 11. The method of claim 9,wherein the second material has a second impurity level less than afirst impurity level of the first material.
 12. The method of claim 9,wherein the cleaning gas is selected from the group consisting of:nitrogen dioxide (NO2), nitrous oxide (N2O), nitrosylazide (N4O),nitrate radical (NO3), dinitrogen trioxide (N2O3), dinitrogen tetroxide(N2O4), dinitrogen pentoxide (N2O5), trinitramide (N(NO2)3), and oxygen(O2).
 13. The method of claim 9, further comprising: while introducingthe precursor gas, introducing an assistance gas near the first surfaceof the repair region.
 14. The method of claim 13, wherein the assistancegas is different from the cleaning gas.
 15. The method of claim 13,wherein the assistance gas is the same as the cleaning gas.
 16. Amethod, comprising: loading a mask having a defect into a chamber;repairing the defect of the mask by forming a repair feature in a repairregion of the mask, wherein the forming the repair feature includes:irradiating a first surface of the repair region with a radiation beam;while irradiating the first surface, performing a sequence to form afirst cleaned sublayer of the repair feature, wherein the sequenceincludes: introducing a precursor gas near the first surface to deposita first sublayer; after the depositing the first sublayer, removing theprecursor gas from near the first surface; and after the removing theprecursor gas, introducing a cleaning gas near the deposited firstsublayer to transform the deposited first sublayer into the firstcleaned sublayer.
 17. The method of claim 16, further comprising:inducing a reaction between the cleaning gas and impurities in thedeposited first sublayer using the radiation beam.
 18. The method ofclaim 17, wherein the impurities include carbon.
 19. The method of claim17, wherein an impurity level of the first cleaned sublayer is at leastless than about 10% of an impurity level of the deposited firstsublayer.
 20. The method of claim 19, further comprising: whileintroducing the precursor gas, introducing an assistance gas near thefirst surface.